1.

Conference Proceedings
Conference Proceedings
1. Wavefront control of UV narrow bandpass filters prepared by plasma ion-assisted deposition [6286-04]
Wang, J. ; Maier, L. R. ; Schreiber, H.
Pub. info.: Advances in thin-film coatings for optical applications III : 13-14 August 2006, San Diego, California, USA.  pp.628604-628604,  2006.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6286
2.

Conference Proceedings
Conference Proceedings
2. Measuring wavefront tilt using shearing interferometry [5965-34]
Schreiber, H.
Pub. info.: Optical fabrication, testing and metrology II : 13-15 September 2005, Jena, Germany.  pp.59650Y-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5965
3.

Conference Proceedings
Conference Proceedings
3. System test for high-NA objectives at the 157-nm wavelength
Schreiber, H.
Pub. info.: Optical fabrication, testing, and metrology : 30 September-3 October 2003, St. Etienne, France.  pp.402-411,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5252
4.

Conference Proceedings
Conference Proceedings
4. 157-nm system test for high-NA lithographic lens systems
Schreiber, H. ; Dewa, P.G. ; Hanford, K.E. ; Ligenza, R.L. ; Rich, L.R. ; Tompkins, P.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1675-1685,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Comparison of actinic lens characterization by aerial image evaluation and interferometric testing for 157-nm high-NA micro-objectives
Schreiber, H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.374-383,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Optical metrology for 193-nm immersion objective characterization
Aronstein, D. ; Bentley, J. ; Dewa, P.G. ; Dunn, M. ; Schreiber, H. ; Nguyen, T. ; Webb, J.E.
Pub. info.: Optical Microlithography XVII.  pp.836-845,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Nanostructure of GdF3 thin film evaluated by variable angle spectroscopic ellipsometry [6321-09]
Wang, J. ; Maier, R. ; Dewa, G. P. ; Schreiber, H. ; Bellman, A. R. ; Corning Inc. (USA)
Pub. info.: Nanophotonic Materials III.  pp.632107-632107,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6321