1.

Conference Proceedings
Conference Proceedings
1. High-resolution profilometry for improved overlay measurements of CMP-processed layers
Mathai,A. ; Schneir,J.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.182-191,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology
Dixson,R. ; Sullivan,N.T. ; Schneir,J. ; McWaid,T.H. ; Tsai,V.W. ; Prochazka,J.J. ; Young,M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.572-588,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
3.

Conference Proceedings
Conference Proceedings
3. Toward accurate linewidth metrology using atomic force microscopy and tip characterization
Dixson,R. ; Schneir,J. ; McWaid,T.H. ; Sullivan,N.T. ; Tsai,V.W. ; Zaidi,S.H. ; Brueck,S.R.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.589-607,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725