1.

Conference Proceedings
Conference Proceedings
1. Application of image-processing software to characterize the photomask key parameters for future technologies
Tran,A. ; Schmidt,M.R. ; Farnsworth,J.N. ; Yan,P.-Y.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.423-432,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Mask defect printability at 0.18-ｦﾌm design rules for 193-nm lithography
Yan,P. ; Tran,A. ; Schmidt,M.R.
Pub. info.: Optical Microlithography X.  pp.308-318,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
3.

Conference Proceedings
Conference Proceedings
3. Inspection and repair of EUV
Fisch,E. ; Kindt,L. ; Lercel,M.J. ; Schmidt,M.R.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.480-485,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
4.

Conference Proceedings
Conference Proceedings
4. Submicron optical CD metrology on photomasks
Schmidt,M.R. ; Dubuque,L.F. ; Gibbs,S.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.173-182,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546