1.

Conference Proceedings
Conference Proceedings
1. Recent advances in a molecular level lithography simulation
Schmid,G.M. ; Singh,V.K. ; Flanagin,L.W. ; Stewart,M.D. ; Burns,S.D. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.675-685,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Understanding molecular-level effects during post-exposure processing
Schmid,G.M. ; Smith,M.D. ; Mack,C.A. ; Singh,V.K. ; Burns,S.D. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1037-1047,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
3.

Conference Proceedings
Conference Proceedings
3. Mechanistic understanding of line-end shortening
Stewart,M.D. ; Schmid,G.M. ; Postnikov,S.V. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.10-18,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings
Conference Proceedings
4. Understanding nonlinear dissolution rates inphotoresists
Burns,S.D. ; Gardiner,A.B. ; Krukonis,V.J. ; Wetmore,P.M. ; Lutkenhaus,J. ; Schmid,G.M. ; Flanagin,L.W. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.37-49,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345