1.

Conference Proceedings
Conference Proceedings
1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology
Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.138-150,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Subnanometer-precision metrology for 100-nm gate linewidth control
Monahan,K.M. ; MacNaughton,C.W. ; Ng,W. ; Marchman,H.M. ; Schlesinger,J.E.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.110-123,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
3.

Conference Proceedings
Conference Proceedings
3. Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography
Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.42-57,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
4.

Conference Proceedings
Conference Proceedings
4. Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography
Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.12-27,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
5.

Conference Proceedings
Conference Proceedings
5. Application of statistical metrology to reduce total uncertainty in the CD-SEM measurement of across-chip linewidth variation
Monahan,K.M. ; Forcier,R.A. ; Ng,W. ; Kudallur,S. ; Sewell,H. ; Marchman,H.M. ; Schlesinger,J.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.54-67,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050