1.

Conference Proceedings
Conference Proceedings
1. INHOMOGENEOUS ELECTRIC POTENTIAL DISTRIBUTIONS INDUCED BY In CLUSTERS GROWN ON P-WSE2 (0001) SURFACES
Schlaf, R. ; Sehnert, H. ; Pettenkofer, C. ; Jaegermann, W.
Pub. info.: Heteroepitaxy of dissimilar materials : symposium held April 29-May 2, 1991, Anaheim, California, U.S.A..  pp.137-142,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 221
2.

Conference Proceedings
Conference Proceedings
2. VAN DER WAALS EPITAXY OF GaSe ON WSe2
Lang, O. ; Schlaf, R. ; Tomm, Y. ; Pettenkofer, C. ; Jaegermann, W.
Pub. info.: Mechanisms of Heteroepitaxial growth : symposium held April 27-30, 1992, San Francisco, California, U.S.A..  pp.291-296,  1992.  Pittsburgh, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 263
3.

Conference Proceedings
Conference Proceedings
3. Carbon nanotube atomic force microscopy cantilevers
Emirov, Y.N. ; Schumacher, J.D. ; Lagel, B. ; Nguyen, N. ; Ren, Z. ; Huang, Z. ; Rossie, B.B. ; Schlaf, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1389-1392,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Making carbon nanotube probes for high aspect ratio scanning probe metrology
Emirov, Y.N. ; Beerbom, M. ; Walters, D.A. ; Ren, Z.F. ; Huang, Z.P. ; Rossie, B.B. ; Schlaf, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.493-495,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
5.

Conference Proceedings
Conference Proceedings
5. Using carbon nanotube cantilevers in scanning probe metrology
Schlaf, R. ; Emirov, Y. ; Bieber, J.A. ; Sikder, A. ; Kohlscheen, J. ; Walters, D.A. ; Islam, M.R. ; Metha, B. ; Ren, Z.F. ; Shofner, T.L. ; Rossie, B.B. ; Cresswell, M.W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.53-57,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689