1.

Conference Proceedings
Conference Proceedings
1. Critical dimension variations of I-line processes due to swing effects [6152-153]
Berger, C. ; Schiwon, R. ; Trepte, S. ; Friedrich, M. ; Kubis, M. ; Horst, J ; Grandpierre, A. G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61523T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
2.

Conference Proceedings
Conference Proceedings
2. Comparison of I-line and DUV high-energy implant litho processes [6152-155]
Grandpierre, A G. ; Berger, C. ; Schroeder, U. P. ; Schiwon, R. ; Kubis, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61523V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings
Conference Proceedings
3. Wafer current measurement for process monitoring
Grandpierre, A. G. ; Schiwon, R. ; Finger, F. ; Schrbder, U. P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.41-50,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
4.

Conference Proceedings
Conference Proceedings
4. In field overlay uncertainty contributors
Schiwon, R. ; Grandpierre, A. G. ; Kubis, M. ; Schroder, U. P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.51-58,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
5.

Conference Proceedings
Conference Proceedings
5. Investigation of systematical overlay errors limiting litho process performance of thick implant resists
Grandpierre, A.G. ; Schiwon, R. ; Bruch, J.-. ; Nacke, C. ; Schroeder, U.P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1118-1124,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375