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13 results

Conference Proceedings

1. Reducing or eliminating line-end shortening and iso/dense bias by tuning NA and sigma

Toublan,O. ; Schiavone,P.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.912-920, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Inorganic bottom ARC SiOxNy for interconnection levels on 0.18-ｦﾌm technology

Trouiller,Y. ; Buffet,N. ; Mourier,T. ; Gobil,Y. ; Schiavone,P. ; Quere,Y.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.324-333, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Flare impact on the intrafield CD control for sub-0.25-ｦﾌm patterning

Luce,E. ; Minghetti,B. ; Schiavone,P. ; Toublan,O. ; Weill,A.P.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.368-381, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

4. 0.18-ｦﾌm optical lithography performances using an alternating DUV phase-shift mask

Trouiller,Y. ; Buffet,N. ; Mourier,T. ; Schiavone,P. ; Quere,Y.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.25-35, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

5. Phase aware proximity correction for advanced masks

Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B. ; Do,T. ; Donnelly,T. ; Granik,Y. ; Schellenberg,F.M. ; Schiavone,P.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.160-170, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Across field and across wafer flare:from KrF stepper to ArF scanner

Trouiller,Y. ; Luce,E. ; Barberet,A. ; Depre,L. ; Schiavone,P.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.880-891, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Prediction of lithographic performance of resist/BARC bilayers in topographic situations:application to organic and inorganic BARCs

Schiltz,A. ; Schiavone,P.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.386-396, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

8. Application of a new approach to optical proximity correction

Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.639-647, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

9. Clear-field alternating PSM for 193-nm lithography

Schiavone,P. ; Lalanne,F.P. ; Prola,A.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.582-589, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

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Conference Proceedings

10. New method of determination of the photoresist Dill parameters using reflectivity measurements

Schiavone,P. ; Bach,S.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1251-1257, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

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Author: Schiavone,P.