Manakli, S. ; Trouiller, Y. ; Toublan, O. ; Schiavone, P. ; Rody, Y.F. ; Goirand, P.J.
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Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA. pp.205-213, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Joubert, O. P. ; Fuard, D. ; Monget, C. ; Schiavone, P. ; Toublan, O. ; Prola, A. ; Temerson, J. M. ; Inglebert, R. L. ; Weidman, T. W. ; Nault, M. P. ; Bekiaris, N.
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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1371-1380, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1750-1761, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1091-1095, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
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Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.498-505, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Besacier, M. ; Schiavone, P. ; Farys, V. ; Smaali, R.
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Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.15-25, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Borjon, A. ; Belledent, J. ; Troullier, Y. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Gardin, C. ; Foussadier, F. ; Schiavone, P.
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25th Annual BACUS Symposium on Photomask Technology. pp.599219-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Evanschitzky, P. ; Erdmann, A. ; Besacier, M. ; Schiavone, P.
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Photomask and Next-Generation Lithography Mask Technology X. pp.1035-1045, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering