1.

Conference Proceedings
Conference Proceedings
1. Alt-PSM for 0.10-ｦﾌm and 0.13-ｦﾌm polypatterning
Schenker,R.E. ; Kirchauer,H. ; Stivers,A.R. ; Tejnil,E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.112-120,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Effects of phase-shift masks on across-field linewidth control
Schenker,R.E.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.18-26,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Material limitations to 193-nm lithographic system lifetimes
Schenker,R.E. ; Piao,F. ; Oldham,W.G.
Pub. info.: Optical Microlithography IX.  Part2  pp.698-706,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
4.

Conference Proceedings
Conference Proceedings
4. Temperature dependence of UV-induced compaction in fused silica
Piao,F. ; Schenker,R.E. ; Oldham,W.G.
Pub. info.: Optical Microlithography X.  pp.907-912,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
5.

Conference Proceedings
Conference Proceedings
5. Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks
Tenjil,E. ; Stivers,A.R. ; Schenker,R.E. ; Zurbrick,L.S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.376-387,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
6.

Conference Proceedings
Conference Proceedings
6. Durability of experimental fused silicas to 193-nm induced compaction
Schenker,R.E. ; Piao,F. ; Oldham,W.G.
Pub. info.: Optical Microlithography X.  pp.44-53,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
7.

Conference Proceedings
Conference Proceedings
7. Comparison of single- and dual-exposure phase-shift mask approaches for polygate patterning
Schenker,R.E.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.242-252,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546