1.

Conference Proceedings
Conference Proceedings
1. Spatially programmable temperature control and measurement for chemically amplified photoresist processing
Schaper,C.D. ; EI-Awady,K.A. ; Tay,A.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.74-79,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
2.

Conference Proceedings
Conference Proceedings
2. Optimal control strategy using linear programming for load disturbance compensation in thermal processing systems
Ho,W.K. ; Tay,A. ; Schaper,C.D.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.24-35,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
3.

Conference Proceedings
Conference Proceedings
3. Real-time control of photoresist thickness uniformity during the bake process
Lee,L.L. ; Schaper,C.D. ; Khuen,H.W.
Pub. info.: Process Control and Diagnostics.  pp.54-64,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182