1.

Conference Proceedings
Conference Proceedings
1. Calibration of OPC models for multiple focus conditions
Schacht, J. ; Herold, K. ; Zimmermann, R. ; Torres, J.A. ; Maurer, W. ; Granik, Y. ; Chang, C.-H. ; Hung, G.K.-C. ; Lin, B.S.-M.
Pub. info.: Optical Microlithography XVII.  pp.691-702,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
2.

Conference Proceedings
Conference Proceedings
2. Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography
Chang, C.H. ; Schacht, J. ; Lin, B.S.-M ; Hung, K.C. ; Huang, I.H.
Pub. info.: Optical Microlithography XVII.  pp.902-910,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
3.

Conference Proceedings
Conference Proceedings
3. Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node
Wallace, C. ; Schacht, J. ; Huang, I.H. ; Hsu, R.H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.238-244,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376