1.

Conference Proceedings
Conference Proceedings
1. MEASUREMENT AND MODELING OF ATOMIC CHLORINE CONCENTRATIONS IN PLASMA PROCESSES
Nicolai, Jean-Philippe ; Allen, Kenneth D. ; Sawin, Herbert H.
Pub. info.: Process diagnostics : materials, combustion, fusion : symposium held April 5-7, 1988, Reno, Nevada, U.S.A..  pp.35-40,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 117
2.

Conference Proceedings
Conference Proceedings
2. CHARACTERIZATION OF SILICON OXIDE ETCHING IN GAS PHASE HF/VAPOR MIXTURES
Muscat, Anthony J. ; Lawing, Scott A. ; Sawin, Herbert H. ; Butterbaugh, Jeff ; Syverson, Dan ; Hiatt, Fred
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.371-378,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
3.

Conference Proceedings
Conference Proceedings
3. Plasma-Assisted Processing: The Etching of Polysilicon in a Diatomic Chlorine Discharge
Sawin, Herbert H. ; Richards, Albert D. ; Thompson, Brian E.
Pub. info.: Integrated circuits : chemical and physical processing : developed from the winter symposium.  pp.164-,  1985.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 290
4.

Conference Proceedings
Conference Proceedings
4. METAL REMOVAL WITH A CIF3 BEAM AT ROOM TEMPERATURE
Chang, Jane P. ; Zhang, Zhe ; Xu, Han ; Sawin, Herbert H. ; Butterbaugh, Jeffley W.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.158-165,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
5.

Conference Proceedings
Conference Proceedings
5. UV/CL2 ETCHING AND CLEANING OF WAFER SURFACES
Lawing, A. Scott ; Muscat, Anthony J. ; Sawin, Herbert H. ; Butterbaugh, Jeffrey W.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.150-157,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20