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24 results

Conference Proceedings

1. Investigation of lithography performance using multipass gray(MPG)with MEBES 5000

Dean,R.L. ; Alexander,D. ; Chabala,J.M. ; Coleman,T. ; Hartglass,C. ; Lu,M. ; Sauer,C.A. ; Weaver,S.

Pub. info.:	15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany. pp.166-178, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3665

Conference Proceedings

2. Use of a MEBES tool to manufacture 180-nm reticles

Sauer,C.A.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.116-130, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

3. Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

Chabala,J.M. ; Abboud,F.E. ; Dean,R.L. ; Weaver,S. ; Cole,D.M. ; Sauer,C.A. ; F.Raymond ? ; Hofmann,U.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part1 pp.80-99, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

4. Multipass gray printing for a new MEBES 4500S mask lithography system

Abboud,F.E. ; Dean,R.L. ; Doering,J.J. ; Eckes,W. ; Gesley,M.A. ; Hofmann,U. ; Mulera,T. ; Naber,R.J. ; Pastor,M. ; Phillips,W. ; Raphael,J. ; Raymond,F.,?. ; Sauer,C.A.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.116-124, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

5. Comparison of DNQ/novolac resists for e-beam exposure

Fedynyshyn,T.H. ; Doran,S.P. ; Lind,M.L. ; Lyszczarz,T.M. ; DiNatale,W.F. ; Lennon,D. ; Sauer,C.A. ; Meute,J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.600-614, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

6. Improving CDs on a MEBES system by improving the ZEP 7000 development and dry etch process

Albrethsen-Keck,B. ; Lu,M. ; Sauer,C.A.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.592-599, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

7. Extension of graybeam writing for the 130-nm technology node

Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.36-48, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

8. Electron-beam lithography simulation for mask making:V. Impact of GHOST proximity effect correction on process window

Mack,C.A. ; Sauer,C.A.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.2-20, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

9. Lithography and CD performance of advanced MEBES mask pattern generators

Chabala,J.M. ; Cole,D.M. ; Pearce-Percy,H.T. ; Phillips,W. ; Lu,M. ; Weaver,S. ; Alexander,D. ; Coleman,T. ; Sauer,C.A. ; Abboud,F.E.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.200-215, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

10.

Conference Proceedings

10. Initial benchmarking of a new electron-beam raster pattern generator for 130-to 100-nm maskmaking

Sauer,C.A. ; Abboud,F.E. ; Babin,S.V. ; Chakarian,V. ; Ghanbari,A. ; Innes,R. ; Trost,D. ; III,F.Raymond

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.284-300, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

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