1.

Conference Proceedings
Conference Proceedings
1. Towards 0.5 nm EOT Scaling of HfO2/Metal Electrode Gate Stacks
Peterson, J. J. ; Brown, G. A. ; Matthews, K. ; Gutt, J. ; Gopalan, S. ; Li, H. -J. ; Kirsch, P. ; Barnett, J. ; Moumen, N. ; Huffman, C. ; Majhi, P. ; Chaudhary, N. ; Young, C. D. ; Sassman, B. ; Lee, B. -H. ; Ruelke, H. ; Schuehrer, H. ; Stephan, R. ; Wei, A. ; Werner, T. ; Wieczorek, K. ; Raab, M.
Pub. info.: Dielectrics for nanosystems: materials science, processing, reliability, and manufacturing : proceedings of the First international symposium.  pp.443-451,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-04
2.

Conference Proceedings
Conference Proceedings
2. Comparison of MOSFET Characteristics Between ALD and MOCVD TiN Metal Gate on Hf Silicate
Song, S.C. ; Lee, B.H. ; Zhang, Z. ; Choi, K. ; Bae, S.H. ; Alshareef, H. ; Majhi, P. ; Wen, H.C. ; Bennett, J. ; Sassman, B. ; Zeitzoff, P.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.419-424,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-06