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30 results

Conference Proceedings

1. Improvement of thickness uniformity of quartz crystal wafer by numerically controlled plasma CVM [5869-17]

Shibahara, M. ; Yamamura, K. ; Sano, Y. ; Sugiyama, T. ; Endo, K. ; Mori, Y.

Pub. info.:	Optical manufacturing and testing VI : 31 July-1 August 2005, San Diego, California, USA. pp.58690I-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5869

Conference Proceedings

2. Strengthening of Si3N4 Ceramics by Laser Peening

Akita, K. ; Sano, Y. ; Takahashi, K. ; Tanaka, H. ; Ohya, S.I.

Pub. info.:	Residual stresses VII : ECRS 7 : proceedings of the 7th European conference on residual stresses, Berlin, Germany, 13-15 September 2006. pp.141-146, 2006. Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	524-525

Conference Proceedings

3. Residual Stress State and Fatigue Behaviour of Laser Shock Peened Titanium Alloys

Altenberger, I. ; Sano, Y. ; Cherif, M.A. ; Nikitin, I. ; Schortes, B.

Pub. info.:	Residual stresses VII : ECRS 7 : proceedings of the 7th European conference on residual stresses, Berlin, Germany, 13-15 September 2006. pp.129-134, 2006. Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	524-525

Conference Proceedings

4. Highly Packed and Ultra-Large Si Grains Grown by a Single-Shot Irradiation of Excimer-Laser Light Pulse

Sano, Y. ; Yeh, W-C. ; Matsumura, M.

Pub. info.:	Thin Film Transistor Technologies V : proceedings of the International Symposium. pp.261-268, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-31

Conference Proceedings

5. High Performance Poly-Si TFTs on Non-Alkali Glass Produced Using Continuous Wave Laser Lateral Crystallization

Hara, A. ; Takeuchi, F. ; Takei, M. ; Suga, K. ; Yoshino, K. ; Chida, M ; Sano, Y. ; Mishima, F. Kakehi. Y. ; Sasaki, N.

Pub. info.:	Thin Film Transistor Technologies VI : proceedings of the international symposium. pp.90-108, 2002. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-23

Conference Proceedings

6. Development of a figure correction method having spatial resolution close to 0.1 mm

Mori, Y. ; Yamauchi, K. ; Yamamura, K. ; Mimura, H. ; Sano, Y. ; Saito, A. ; Endo, K. ; Souvorov, A. ; Yabashi, M. ; Tamasaku, K. ; Ishikawa, T.

Pub. info.:	Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA. pp.105-111, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5193

Conference Proceedings

7. Compressive Residual Stress Evolution Process by Laser Peening

Akita, K. ; Tanaka, H. ; Sano, Y. ; Ohya, S. I.

Pub. info.:	Residual stresses VII : ICRS 7 : proceedings of the 7th International Conference on Residual Stresses, ICRS-7 Xi'an, China, 14-17, June, 2004. pp.370-375, 2005. Uetikon-Zuerich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	490-491

Conference Proceedings

8. Theoretical Study on the Structures and Electronic Properties of Sc3-nLanN@C80 (n = 0-3).

Kobayashi, K. ; Sano, Y. ; Nagase, S.

Pub. info.:	Fullerenes : fullerenes for the new millennium : proceedings of the International Symposium on Fullerenes, Nanotubes, and Carbon Nanoclusters. pp.313-322, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-11

Conference Proceedings

9. Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy

Mori, Y. ; Yamauchi, K. ; Yamamura, K. ; Mimura, H. ; Sano, Y. ; Saito, A. ; Endo, K. ; Souvorov, A. ; Yabashi, M. ; Tamasaku, K. ; Ishikawa, T. ; Shimura, M. ; Ishizaka, Y.

Pub. info.:	Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA. pp.11-17, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5193

10.

Conference Proceedings

10. Are IPR-Satisfying Structures Most Stable for 5c3@C82 and 5c4@C82?

Kobayashi, K. ; Sano, Y. ; Nagase, S.

Pub. info.:	Recent Advances in the Chemistry and Physics of Fullerenes and Related Materials : proceedings of the twelfth International Symposium. pp.787-794, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-12

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