1.

Conference Proceedings
Conference Proceedings
1. Liquid immersion lithography: evaluation of resist issues
Hinsberg, W. ; Wallraff, G.M. ; Larson, C.E. ; Davis, B.W. ; Deline, V. ; Raoux, S. ; Miller, D. ; Houle, F.A. ; Hoffnagle, J. ; Sanchez, M.I. ; Rettner, C. ; Sundberg, L.K. ; Medeiros, D.R. ; Dammel, R.R. ; Conley, W.E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.21-33,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. High-NA lithographic imagery at Brewster's angle
Brunner, T.A. ; Seong, N. ; Hinsberg, W.D. ; Hoffnagle, J.A. ; Houle, F.A. ; Sanchez, M.I.
Pub. info.: Optical Microlithography XV.  Part One  pp.1-10,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern
Nguyen, C.V. ; Stevens, R.M.D. ; Barber, J. ; Han, J. ; Meyyappan, M. ; Sanchez, M.I. ; Larson, C.E. ; Hinsberg, W.D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.58-62,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
4.

Conference Proceedings
Conference Proceedings
4. High numerical aperture: imaging implications for chemically amplified photoresists
Sanchez, M.I. ; Houle, F.A. ; Hoffnagle, J.A. ; Brunner, T.A. ; Hinsberg, W.D.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.351-356,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. Characterization of photoresist spatial resolution by interferometric lithography
Hoffnagle, J.A. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.464-472,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
6.

Conference Proceedings
Conference Proceedings
6. EUV photoresist performance results from the VNL and the EUV LLC
Cobb, J.L. ; Dentinger, P.M. ; Hunter, L.L. ; O'Connell, D.J. ; Gallatin, G.M. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Domke, W.-D. ; Wurm, S. ; Okoroanyanwu, U. ; Lee, S.H.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.412-420,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
7.

Conference Proceedings
Conference Proceedings
7. Does line-edge roughness matter?: FEOL and BEOL perspectives
Lin, Q. ; Black, C.T. ; Detavernier, C. ; Gignac, L. ; Guarini, K. ; Herbst, B. ; Kim, H. ; Oldiges, P. ; Petrillo, K.E. ; Sanchez, M.I.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1076-1085,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
8.

Conference Proceedings
Conference Proceedings
8. Using the critical ionization model for resist development to estimate contrast curves and roughening
Houle, F.A. ; Hinsberg, W.D. ; Sanchez, M.I.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.334-342,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
9.

Conference Proceedings
Conference Proceedings
9. Extendibility of chemically amplified resists: another brick wall? (Invited Paper)
Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Hoffnagle, J.A. ; Wallraff, G.M. ; Medeiros, D.R. ; Gallatin, G.M. ; Cobb, J.L.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.1-14,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
10.

Conference Proceedings
Conference Proceedings
10. Impact of thin resist processes on post-etch LER
Mahorowala, A.P. ; Goldfarb, D.L. ; Temple, K. ; Petrillo, K.E. ; Pfeiffer, D. ; Babich, K. ; Angelopoulos, M. ; Gallatin, G.M. ; Rasgon, S. ; Sawin, H.H. ; Allen, S.D. ; Lang, R.N. ; Lawson, M.C. ; Kwong, R.W. ; Chen, K.-J. ; Li, W. ; Varanasi, P.R. ; Sanchez, M.I. ; Ito, H. ; Wallraff, G.M. ; Allen, R.D.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.213-224,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039