1.

Conference Proceedings
Conference Proceedings
1. Approach to pattern aspect ratio control
Thomas,A.C. ; Zach,F.X. ; Wong,A.K. ; Ferguson,R.A. ; Samuels,D.J. ; Longo,R. ; Zhu,J. ; Feild,C.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.839-846,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Pattern transfer at k1=0.5:get 0.25-ｦﾌm lithography ready for manufacturing
Maurer,W. ; Satoh,K. ; Samuels,D.J. ; Fischer,T.
Pub. info.: Optical Microlithography IX.  Part1  pp.113-124,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
3.

Conference Proceedings
Conference Proceedings
3. Viability of conventional high-NA KrF imaging for sub-0.25-ｦﾌm lithography
Farrell,T.R. ; Nunes,R. ; Campbell,R. ; Hoh,P. ; Samuels,D.J. ; Kirk,J.P. ; Conley,W.E. ; Iba,J. ; Shibata,T.
Pub. info.: Optical Microlithography IX.  Part1  pp.46-53,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
4.

Conference Proceedings
Conference Proceedings
4. Challenge of 1-Gb DRAM development when using optical lithography
Farrell,T.R. ; Nunes,R. ; Samuels,D.J. ; Thomas,A. ; Ferguson,R.A. ; Molless,A. ; Wong,A.K. ; Conley,W. ; Wheeler,D.C. ; Credendino,S. ; Naeem,M. ; Hoh,P. ; Lu,Z.
Pub. info.: Optical Microlithography X.  pp.333-341,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
5.

Conference Proceedings
Conference Proceedings
5. Process dependencies of optical proximity corrections
Zach,F.X. ; Samuels,D.J. ; Thomas,A.C. ; Butt,S.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.113-118,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Good OPC:where will this drive mask CD tolerance and mask grid size
Samuels,D.J. ; Maurer,W. ; Farrell,T.R.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.588-596,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621