1.

Conference Proceedings
Conference Proceedings
1. OPC to improve lithographic process window [6156-29]
Word, J. ; Sakajiri, K.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. On objectives and algorithms of inverse methods in microlithography [6349-184]
Granik, Y. ; Sakajiri, K. ; Shang, S.
Pub. info.: Photomask Technology 2006.  pp.63494R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Model-based insertion of assist features using pixel inversion method: implementation in 65 nm node [6283-69]
Hung, -Y. C. ; Liu, Q. ; Sakajiri, K. ; Shang, D. S. ; Granik, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283