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Photon migration and diffuse-light imaging II : 12-16 June 2005, Munich, Germany. pp.58590S-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Pits and Pores : formation, properties, and significance for advanced materials : proceedings of the International Symposium. pp.313-317, 2000. Pennington, N.J.. Electrochemical Society
Sakaguchi, K. ; Kurisu, H. ; Ohmi, K. ; Yonehara, T.
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Pits and Pores : formation, properties, and significance for advanced materials : proceedings of the International Symposium. pp.318-325, 2000. Pennington, N.J.. Electrochemical Society
Sakaguchi, K. ; Tsuboi, T. ; Yanagita, K. ; Okabe, T. ; Takahashi, K. ; Sato, N.
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Semiconductor wafer bonding : science, technology, and applications : proceedings of the international symposia. pp.31-38, 2003. Pennington, NJ. Electrochemical Society
Proceedings of the Third International Symposium on Semiconductor Wafer Bonding : physics and applications. pp.47-55, 1995. Pennington, NJ. Electrochemical Society
Fomin, S. ; Shimizu, A. ; Matsuki, K. ; Sakaguchi, K. ; Hashida, T.
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Sixth International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering : 10-16 June, 2002, St. Petersburg, Russia. pp.216-221, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Semiconductor wafer bonding : science, technology, and applications : proceedings of the international symposia. pp.197-204, 2001. Pennington, NJ. Electrochemical Society
Sato, N. ; Sakaguchi, K. ; Yamagata, K. ; Fujiyama, Y. ; Yonehara, T.
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Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology. pp.443-454, 1994. Pennington, NJ. Electrochemical Society