1.

Conference Proceedings
Conference Proceedings
1. 90nm node contact hole patterning through applying model based OPC in KrF lithography
Y.-D. Jeon ; S.-U. Lee ; J. Choi ; J. Kim ; J. Han
Pub. info.: Optical Microlithography XXI.  2  pp.69242W-1-69242W-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. Application of modified jog-fill DRC rule on LFD OPC flow
Y.-M. Kim ; S.-U. Lee ; J.-H. Kang ; J.-H. Kim ; K.-H. Kim
Pub. info.: Photomask technology 2007.  3  pp.67303W-1-67303W-7,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
3.

Conference Proceedings
Conference Proceedings
3. Fundamental study on the error factor for sub 90nm OPC modeling
H. Lee ; S.-U. Lee ; J. Kim ; K. Kim
Pub. info.: Photomask technology 2007.  3  pp.673058-1-673058-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730