1.

Conference Proceedings
Conference Proceedings
1. Application of alternating phase shift mask to device fabrication
S.-G. Kim ; S.-G. Woo ; W.-S. Han ; Y.-B. Koh ; M.-Y. Lee
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.515-523,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
2.

Conference Proceedings
Conference Proceedings
2. Fidelity comparison of island patterns with different types of illuminations and phase shift masks
S.-Y. Moon ; W.-S. Han ; S.-G. Woo ; C.-J. Sohn ; C.-H. Kim
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.784-795,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
3.

Conference Proceedings
Conference Proceedings
3. Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions
S.-C. Lim ; S.-G. Woo ; W.-S. Han ; Y.-B. Koh ; M.-Y. Lee
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.372-383,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
4.

Conference Proceedings
Conference Proceedings
4. Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL
I.-Y. Jang ; S.-M. Huh ; S.-Y. Moon ; S.-G. Woo ; J.-K. Lee
Pub. info.: Photomask technology 2008.  2  pp.712228-1-712228-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
5.

Conference Proceedings
Conference Proceedings
5. 2D measurement using CD SEM for arbitrarily shaped patterns
H.-J. Lee ; S.-Y. Bae ; D.-H. Chung ; S.-G. Woo ; H. Cho
Pub. info.: Photomask technology 2007.  2  pp.673037-1-673037-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
6.

Conference Proceedings
Conference Proceedings
6. A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability
S. H. Han ; J. H. Park ; D. H. Chung ; S.-G. Woo ; H. K. Cho
Pub. info.: Photomask technology 2007.  2  pp.673024-1-673024-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
7.

Conference Proceedings
Conference Proceedings
7. The study of CD error in mid-local pattern area caused by develop loading effect
M.-K. Kang ; J.-H. Lee ; S.-Y. Kim ; B.-G. Kim ; S.-G. Woo
Pub. info.: Photomask technology 2007.  1  pp.67300H-1-67300H-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730