1.

Conference Proceedings
Conference Proceedings
1. HfO2 Gate Dielectrics Deposited via Tetrakis Dlethylamido Hafnium
J. Schaeffer ; N. V. Edwards ; R. Liu ; D. Roan ; B. Hradsky ; R. Gregory ; J. Kulik ; E. Duda ; L. Contreras ; J. Christiansen ; S. Zollner ; P. Tobin ; B.-Y. Nguyen ; R. Nieh ; M. Ramon ; R. Rao ; R. Hegde ; R. Rai ; J. Baker ; S. Voight
Pub. info.: Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues.  pp.49-62,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-28
2.

Conference Proceedings
Conference Proceedings
2. Dual Substrate Orientation Integration for High Performance (110) PMOS
G. Karve ; W. Ted ; D. Eades ; M. Sadaka ; G. Spencer ; J. Hackenberg ; J. Norbert ; T. Kropewnicki ; S. Zollner ; P. Beckage ; J. Grant ; R. Garcia ; B. Nguyen ; N. Cave ; M. Hall ; J. Cheek ; S. Venkatesan ; C. Lin ; I. Wu
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.363-370,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)