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11 results

Conference Proceedings

1. Role of Binders in High Temperature PEMFC Electrode

J. O. Park ; S. Hong ; T. Kim ; K. Kwon ; S. Suh ; M. Cho ; D. Yoo

Pub. info.:	Proton exchange membrane fuel cells 6. pp.447-452, 2006. Pennington, NJ. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	3(1)

Conference Proceedings

2. Virtual OPC at hyper NA lithography

S. Lee ; S. Kim ; Y. Chun ; S. Suh ; Y. Jang ; S. Choi ; W. Han

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

3. Fast and accurate 3D mask model for full-chip OPC and verification

P. Liu ; Y. Cao ; L. Chen ; G. Chen ; M. Feng ; J. Jiang ; H. Liu ; S. Suh ; S. Lee

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

4. OPC in memory-device patterns using boundary layer model for 3-dimensional mask topographic effect

Y. Kim ; I. Kim ; J. Park ; S. Kim ; S. Suh ; Y. Cheon ; S. Lee ; J. Lee ; C. Kang ; J. Moon ; J. Cobb ; S. Lee

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

5. Stray-light implementation in optical proximity correction (OPC)

Y. -C. Kim ; D. Kim ; I. Kim ; S. Kim ; S. Suh ; Y. -J. Chun ; S. Lee ; J. Lee ; C. -J. Kang ; J. Moon ; K. Taravade ; S. Lee

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

6. Merged contact OPC using pattern type specific modeling and correction

S. Suh ; S. Kim ; S. Lee ; Y. Kim ; J. Lee ; C. Kang

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

7. Robust approach to determine the optimized illumination condition using process window analysis

Y. -J. Chun ; S. -W. Lee ; S. Lee ; Y. -M. Lee ; S. Suh ; S. -J. Lee ; H. -K. Cho ; H. -J. Park ; B. Falch

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

8. Three-dimensional mask effect approximate modeling for sub-50-nm node device OPC

S. Suh ; S. Lee ; K. Back ; Y. Kim ; S. Kim ; Y. Chun

Pub. info.:	Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6521

Conference Proceedings

9. Optical proximity correction for elongated contact-hole printing

Y.-C. Kim ; S. Kim ; S. Suh ; Y. Cheon ; S. Lee

Pub. info.:	Optical Microlithography XXI. 3 pp.69243Q-1-69243Q-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

10.

Conference Proceedings

10. Selective process aware OPC for memory device

W. Shim ; S. Suh ; F. Amoroso ; R. Lugg ; S. Lee

Pub. info.:	Photomask technology 2007. 2 pp.67302P-1-67302P-10, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

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Author: S. Suh