1.

Conference Proceedings
Conference Proceedings
1. Enabling 35nm double patterning contact imaging using a novel CD shrink process
Y. Yamada ; M. M. Crouse ; S. Dunn ; T. Kawasaki ; S. Shimura
Pub. info.: Optical Microlithography XXI.  2  pp.69242D-1-69242D-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. Transfer mechanism of defects on topcoat to resist pattern in immersion lithography process and effects on etching process
N. Takahashi ; S. Shimura ; T. Kawasaki
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
3.

Conference Proceedings
Conference Proceedings
3. Defectivity reduction studies for ArF immersion lithography
K. Matsunaga ; T. Kondoh ; H. Kato ; Y. Kobayashi ; K. Hayasaki ; S. Ito ; A. Yoshida ; S. Shimura ; T. Kawasaki ; H. Kyoda
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
4.

Conference Proceedings
Conference Proceedings
4. Fabrication of 32-nm contact/via hole by photolithographic-friendly method
S. Kawasaki ; S. Shimura ; F. Iwao ; E. Nishimura ; M. Kushibiki
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.692333-1-692333-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
5.

Conference Proceedings
Conference Proceedings
5. Advanced resist process enabling implementation of CD controllability for 32 nm and beyond
S. Shimura ; F. lwao ; T. Kawasaki ; D. Shannon ; Y. Tanaka
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.69233C-1-69233C-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923