1.

Conference Proceedings
Conference Proceedings
1. Some non-resist component contributions to LER and LWR in 193-nm lithography
T. Kudo ; S. Chakrapani ; G. Lin ; C. Anyadiegwu ; C. Antonio ; D. Parthasarathy ; R. R. Dammel ; M. Padmanaban
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Novel diamantane polymer platform for enhanced etch resistance
M. Padmanaban ; S. Chakrapani ; G. Lin ; T. Kudo ; D. Parthasarathy ; D. Rahman ; C. Anyadiegwu ; C. Antonio ; R. R. Dammel ; S. Liu ; F. Lam ; A. Waitz ; M. Yamagchi ; T. Maehara
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519