1.

Conference Proceedings
Conference Proceedings
1. Benchmarking of current generation overlay systems at the 130-nm technology node
Russo, B. ; Bishop, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.793-802,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Comparison of measured optical image profiles of silicon lines with two different theoretical models
Silver, R.M. ; Attota, R. ; Stocker, M. ; Jun, J.J. ; Marx, E. ; Larrabee, R.D. ; Russo, B. ; Davidson, M.P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.409-429,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
3.

Conference Proceedings
Conference Proceedings
3. Overlay tool comparison for sub-130-nm technologies
Russo, B. ; Bishop, M. ; Benoit, D.C. ; Silver, R.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.261-272,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689