1.

Conference Proceedings
Conference Proceedings
1. IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS
Teerlinck, I. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Hurd, T.Q. ; Mouche, L. ; Mertens, P.W. ; Meuris, M. ; Heyns, M.M. ; Vanhaeren, D. ; Vandervorst, W.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.284-291,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
2.

Conference Proceedings
Conference Proceedings
2. SURFACE COMPLEXATION OF METALS: A PREDICTIVE MODEL BASED ON METAL COORDINATION CHEMISTRY -
Hurd, T.Q. ; Rotondaro, A.L.P. ; Sees, J. ; Misra, A. ; Appel, C.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.105-112,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
3.

Conference Proceedings
Conference Proceedings
3. METAL INTERACTIONS WITH SILICA (SiO2) SURFACES: ADSORPTION AND ION EXCHANGE
Hurd, T.Q. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Mertens, P.W. ; Hall, L.H. ; Heyns, M.M.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.277-283,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
4.

Conference Proceedings
Conference Proceedings
4. DRY CLEANING FOR DEEO SUBMICRON VIAS
Rotondaro, A.L.P. ; Aldrich, D.B. ; Smith, P.B. ; Appel, C.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.322-327,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
5.

Conference Proceedings
Conference Proceedings
5. DRY PROCESS FOR THE DEFINITION OF SUB 0.lμm W/TiN GATES
Rotondaro, A.L.P. ; Yang, H. ; Hu, J.C. ; Kraft, R. ; Brown, G. ; Appel, C.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.344-349,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
6.

Conference Proceedings
Conference Proceedings
6. A SEMI-QUANTITATIVE METHOD FOR STUDYING PHOTORESIST STRIPPING
Rotondaro, A.L.P. ; Meuris, M. ; Schmidt, H.F. ; Heyns, M.M. ; Vandervorst, W. ; Claeys, C. ; Hellemans, L. ; Snauvaert, I.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.581-586,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
7.

Conference Proceedings
Conference Proceedings
7. Investigation of In-Situ Steam Generated Oxide (ISSG) followed by Remote Plasma Nitridation (RPN) for Effective Oxide Thickness Decrease and Gate Leakage Reduction
Eason, K. ; Jallepally, R. ; Noble, D. ; Hattangady, S. ; Khamankar, R. ; Rotondaro, A.L.P.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.195-202,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
8.

Conference Proceedings
Conference Proceedings
8. USE OF H2SO4 FOR ETCH RATE AND SELECTIVITY CONTROL OF BOILING H3PO4
Rotondaro, A.L.P. ; Hames, G.A. ; Yocum, T.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.385-390,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
9.

Conference Proceedings
Conference Proceedings
9. The potential and restrictions of the double derivative method for threshold voltage extraction in SOI MOSFET's
Simoen, E. ; Vandamme, E. ; Rotondaro, A.L.P. ; Claeys, C.
Pub. info.: Proceedings of the Sixth International Symposium on Silicon-on-Insulator Technology and Devices.  pp.318-323,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-11
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Conference Proceedings
Conference Proceedings
10. Novel HfSiON Gate Dielectric for Advanced CMOS Devices
Colombo, L. ; Visokay, M.R. ; Chambers, J.J. ; Rotondaro, A.L.P. ; Shanware, A. ; Bevan, M.J. ; Bu, H. ; Tsung, L.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.199-206,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11