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19 results

Conference Proceedings

1. Electron-beam lithography on multilayer substrates: experimental and theoretical study

Raptis,I. ; Meneghini,G. ; Rosenbusch,A. ; Glezos,N. ; Palumbo,R. ; Ardito,M. ; Scopa,L. ; Patsis,G. ; Valamontes,E. ; Argitis,P.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.431-441, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

2. Application of a new approach to optical proximity correction

Rosenbusch,A. ; Hourd,A.C. ; Juffermans,C.A. ; Kirsch,H. ; Lalanne,F.P. ; Maurer,W. ; Romeo,C. ; Ronse,K. ; Schiavone,P. ; Simecek,M. ; Toublan,O. ; Vermeuien,T. ; Watson,J.C. ; Ziegler,W.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.639-647, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. Incorporation of laser proximity correction into mask production

Rosenbusch,A. ; Unruh,J. ; Kirsch,H. ; Chan,D.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.513-522, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Improvements to mask inspectability by use of pattern proximity correction

Rosenbusch,A. ; Bailey,V. ; Eran,Y. ; Falah,R. ; Holmes,N.J. ; Hourd,A.C. ; McArthur,A. ; Staud,W.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.190-199, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

5. Hierarchical e-beam proximity correction in mask making

Hofmann,U. ; Kalus,C.K. ; Rosenbusch,A. ; Jonckheere,R. ; Hourd,A.C.

Pub. info.:	Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California. pp.150-158, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2723

Conference Proceedings

6. Mask process design optimization based on quality mapping using standard mask inspection equipment

Kuo,S.C. ; Tan,T. ; Rosenbusch,A. ; Eran,Y. ; Lindman,O. ; Gottlib,G.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.459-466, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

7. Hierarchical proximity correction using CAPROX

Hofmann,U. ; Kalus,C.K. ; Rosenbusch,A. ; Endo,H. ; Kimura,Y. ; Endo,A.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.558-567, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

8. Impact of pattern proximity correction on die-to-database mask inspection

Rosenbusch,A. ; Bailey,V. ; Eran,Y. ; Falah,F. ; Hamar,S. ; Holmes,H.J. ; Hound,A.C. ; Kirsch,H. ; McArthur,A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.479-486, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

9. Defect dispositioning using mask printability on attenuated phase-shift production photomasks

Novak,J.W. ; Eynon,B.G. ; Poortinga,E. ; Rosenbusch,A. ; Eran,Y.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.881-889, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

10.

Conference Proceedings

10. New approach to improve CD uniformity based on mask quality

Liebe,R. ; Jaehnert,C. ; Gottlib,G. ; Eran,Y. ; Hemar,S. ; Sade,A. ; Rosenbusch,A.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.647-653, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

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Author: Rosenbusch,A.