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22 results

Conference Proceedings

1. High-Density, Low-Loss MOS Decoupling Capacitors Integrated in a GSM Power Amplifier

Roozeboom, F. ; Kemmeren, A. ; Verhoeven, J. ; van den Heuvel, E. ; Kretschman, H. ; Fric, T.

Pub. info.:	Materials, integration and packaging issues for high-frequency devices. pp.157-164, 2004. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	783

Conference Proceedings

2. The Role of Preamorphization and Activation for Ultra-Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer

Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.

Pub. info.:	Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.423-430, 2004. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	810

Conference Proceedings

3. Dopant Diffusion in Amorphous Silicon

Duffy, R. ; Venezia, V.C. ; Heringa, A. ; Hopstaken, M.J.P. ; Maas, G.C.J. ; Dao, T. ; Tamminga, Y. ; Roozeboom, F.

Pub. info.:	Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.437-442, 2004. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	810

Conference Proceedings

4. The Role of Preamorphization and Activation for Ultra Shallow Junction Formation on Strained Si Layers Grown on SiGe Buffer

Pawlak, B.J. ; Vandervorst, W. ; Lindsay, R. ; Wolf, I.De ; Roozeboom, F. ; Delhougne, R. ; Benedetti, A. ; Loo, R. ; Caymax, M. ; Maex, K. ; Cowern, N.E.B.

Pub. info.:	High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.281-286, 2004. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	809

Conference Proceedings

5. High-Density, Low-Loss MOS Capacitors for Integrated RF Decoupling

Roozeboom, F. ; Elfrink, R.J.G. ; Rijks, G.S.M., Th ; Verhoeven, J.F.C.M. ; Kemmeren, A. ; van den Meerakker, J.E.A.M.

Pub. info.:	Proceedings : International Symposium on Advanced Packaging Materials : processes, properties and interfaces, Chateau Elan, Braselton, Georgia, March 11-14, 2001. pp.477-483, 2001. Washington, DC. IMAPS
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4587

Conference Proceedings

6. Control Of A Metal-Electrode Work-Function By Solid-State Diffusion Of Nitrogen

Lander, R.J.P. ; Hooker, J.C. ; Zijl, J.P. van ; Roozeboom, F. ; Maas, M.P.M. ; Tamminga, Y. ; Wolters, R.A.M.

Pub. info.:	Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.. pp.253-260, 2002. Warrendale. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	716

Conference Proceedings

7. Experimental study on the mechanism of carbon diffusion in silicon

Cowern, N.E.B. ; Colombeau, B. ; Roozeboom, F. ; Hopstaken, M. ; Snijders, H. ; Meunier-Beillard, P. ; Lerch, W.

Pub. info.:	Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.. pp.255-262, 2002. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	717

Conference Proceedings

8. Laser Annealing for Ultra-Shallow Junction Formation in Advanced CMOS

Surdeanu, R. ; Ponomarev, Y.V. ; Cerutti, R. ; Pawlak, B.J. ; Nanver, L.K. ; Hoflijk, I. ; Stolk, P.A. ; Dachs, C.J.J. ; Verheijen, M.A. ; Kaiser, M. ; Hopstaken, M.J.P. ; van Berkum, J.G.M. ; Roozeboom, F. ; Lindsay, R.

Pub. info.:	Rapid thermal and other short-time processing technologies III : proceedings of the international symposium. pp.413-428, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-11

Conference Proceedings

9. Role of Silicon and Boron Interstitial Clusters in Transient Enhanced Diffusion

Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; van Berkum, J.G.M ; Colombeau, B. ; Claverie, A.

Pub. info.:	Rapid thermal and other short-time processing technologies : proceedings of the international symposium. pp.61-72, 2000. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-9

10.

Conference Proceedings

10. Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon

Cowern, N.E.B. ; Mannino, G. ; Roozeboom, F. ; Stalk, P.A. ; Huizing, H.G.A. ; van Berkum, J.G.M ; Toan, N.N. ; Woerlee, P.H. ; Cristiano, F. ; Claverie, A.

Pub. info.:	Advances in rapid thermal processing : proceedings of the symposium. pp.125-132, 1999. Pennington, N. J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-10

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