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11 results

Conference Proceedings

1. Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes

Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.170-179, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. MEEF management and the effect of assist feature optical proximity corrections

Reilly,M.T. ; Parker,C.R. ; Robertson,S.A.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.180-187, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

3. Novel analysis technique for examining the effect of exposure conditions on the mask error enhancement factor

Robertson,S.A. ; Reilly,M.T. ; Parker,C.R.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.153-161, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

4. Toward a universal resist dissolution model for lithography simulation

Robertson,S.A. ; Mack,C.A. ; Maslow,M.J.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.111-122, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

5. Comparison of simulation approaches for chemically amplified resists

Erdmann,A. ; Henke,W. ; Robertson,S.A. ; Richter,E. ; Tollkuhn,B. ; Hoppe,W.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.99-110, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

6. Effect of exposure tool illumination settings and objective numerical aperture on the standing wave period within photoresist

Robertson,S.A. ; Linskens,F.T.G.M. ; Szmanda,C.R. ; Dempsey,K.J.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.962-975, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

7. Factors affecting pitch bias in lithography simulation

Robertson,S.A. ; Pavelchek,E.K. ; Swible-Keane,C.I. ; Bohiand,J.F. ; Reilly,M.T.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.744-758, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

8. Simulation of 193-nm photoresists based on different polymer platforms

Kang,D. ; Robertson,S.A. ; Pavelchek,E.K.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.936-944, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

9. Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes

Kang,D. ; Robertson,S.A. ; Reilly,M.T. ; Pavelchek,E.K.

Pub. info.:	Optical Microlithography XIV. 4346 pp.858-868, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Improved notch moedl for resist dissolution in lithography simulation

Robertson,S.A. ; Pavelchek,E.K. ; Hoppe,W. ; Wildfeuer,R.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.912-920, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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