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Conference Proceedings

1. The Effect Of Impurities On Diffusion And Activation Of Ion Implanted Boron In Silicon

Robertson, L.S. ; Brindos, R. ; Jones, K. S. ; Law, Mark E. ; Downey, D. F. ; Falk, S. ; Liu, J.

Pub. info.:	Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A.. pp.B5.8-, 2001. Warrendale, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	610

Conference Proceedings

2. Effect Of Fluorine On The Diffusion Of Boron In Amorphous Silicon

Jacques, J.M. ; Robertson, L.S. ; Jones, K.S. ; Bennett, Joe ; Rendon, Mike

Pub. info.:	Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.. pp.175-180, 2002. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	717

Conference Proceedings

3. Enhanced Boron Diffusion in Amorphous Silicon

Jacques, J.M. ; Burbure, N. ; Jones, K.S. ; Law, M.E. ; Robertson, L.S. ; Downey, D.F. ; Rubin, L.M. ; Bennett, J. ; Beebe, M. ; Klimov, M.

Pub. info.:	Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.443-448, 2004. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	810

Conference Proceedings

4. Electrical and Structural Characterization of Boron Implanted Silicon Following Laser Thermal Processing

Jones, K.S. ; Gable, K.A. ; Law, M.E. ; Robertson, L.S. ; Talwar, S.

Pub. info.:	Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.. pp.45-50, 2002. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	717