Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.375-382, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
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Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.32-53, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.122-131, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.92-101, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1028-1045, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.313-321, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering