1.

Conference Proceedings
Conference Proceedings
1. Design of an etch-resistant cyclic olefin photoresist
Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; DiPietro,R.A. ; Hofer,D.C. ; Jayaraman,S. ; Hullihan,K.A. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.463-471,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. AVATRELTM DIELECTRIC POLYMERS FOR HDP APPLICATIONS
McDougall,William C. ; Farling,S. ; Shick,R. ; Glukh,S. ; Jayaraman,S.K. ; Rhodes,L.F. ; Vicari,R. ; Kohl,P. ; Bidstrup-Allen,S.A. ; Chiniwalla,P.
Pub. info.: 1999 International Conference on High Density Packaging and MCMs : 6-9 April 1999, The Adam's Mark Hotel, Denver, Colorado.  pp.17-20,  1999.  Reston, VA.  IMAPS
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3830
3.

Conference Proceedings
Conference Proceedings
3. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. High-performance polymeric materials for waveguide applications
Glukh,K. ; Lipian,J.-H. ; Mimna,R. ; Neal,P.S. ; Ravikiran,R. ; Rhodes,L.F. ; Shick,R.A. ; Zhao,X.-M.
Pub. info.: Linear, nonlinear, and power-limiting organics : 31 July-3 August 2000, San Diego, USA.  pp.43-53,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4106
5.

Conference Proceedings
Conference Proceedings
5. Novel Photosensitive Dielectric Materials Based on Polynorbornene for Wafer Level Packaging Applications
McDougall,William ; Elce,E. ; Shick,R.A. ; Rhodes,L.F. ; Jayaraman,S.K. ; Bai,Y. ; Bidstrup-Allen,S.A. ; Chiniwalla,P. ; Kohl,P.
Pub. info.: 2000 International Conference on High-Density Interconnect and Systems Packaging, 25-28 April 2000, The Adam's Mark Hotel, Denver, Colorado, USA.  pp.569-572,  2000.  Reston, VA, Bellingham, Wash..  IMAPS — SPIE-The International Society for Optical
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4217