1.

Conference Proceedings
Conference Proceedings
1. Fabrication of Submicron Structures in Polycristalline Silicon by Reactive Ion Etching Using Fluorine- and Chlorine- Containing Plasmas
Reyes-Betanzo, C. ; Moshkalyov, S.A. ; Seabra, A.C. ; Swart, J.W.
Pub. info.: Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium.  pp.357-362,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-9
2.

Conference Proceedings
Conference Proceedings
2. Reactive Ion Etching of SiGe Using Halogen-Based Plasmas
Reyes-Betanzo, C. ; Moshkalyov, S. A.
Pub. info.: Microelectronics technology and devices : SBMICRO 2004 : proceedings of the nineteenth international symposium.  pp.345-350,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-03
3.

Conference Proceedings
Conference Proceedings
3. Silicon Microstructures: 3-D Micromachining with KOH Solution
Calleja, W. ; Reyes-Betanzo, C. ; Aragon, J.
Pub. info.: Microelectronics technology and devices : SBMICRO 2005 : proceedings of the twentieth international symposium.  pp.398-407,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-08
4.

Conference Proceedings
Conference Proceedings
4. Selective Silicon Nitride Etching by ECR Plasmas Using SF6 and NF3 Based Gas Mixtures
Reyes-Betanzo, C. ; Moshkalyov, S.A. ; Swart, J.W. ; Ramos, A.C.S.
Pub. info.: Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium.  pp.292-301,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-9
5.

Conference Proceedings
Conference Proceedings
5. Synthesis of Carbon Nanotubes by Plasma-Enhanced Chemical Vapor Deposition
Moshkalyov, S.A. ; Reyes-Betanzo, C. ; Swart, J.W. ; Ramos, A.C.S.
Pub. info.: Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium.  pp.311-315,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-9
6.

Conference Proceedings
Conference Proceedings
6. Deep Anisotropic Etching of Silicon with Smooth Surface for Micromachining Applications
Moshkalyov, S.A. ; Reyes-Betanzo, C. ; Swart, J.W.
Pub. info.: Microelectronics technology and devices : SBMICRO 2002 : proceedings of the seventeenth international symposium.  pp.293-301,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-8
7.

Conference Proceedings
Conference Proceedings
7. Study of Power Balance in Asymmetric Capacitively Coupled Discharge Plasmas used for Material Processing
Moshkalyov, S.A. ; Reyes-Betanzo, C. ; Swart, J.W.
Pub. info.: Microelectronics technology and devices : SBMICRO 2002 : proceedings of the seventeenth international symposium.  pp.178-187,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-8
8.

Conference Proceedings
Conference Proceedings
8. Effect of Oxygen and Nitrogen Additions on Silicon Nitride Reactive Ion Etching in Fluorine Containing Plasmas
Reyes-Betanzo, C. ; Moshkalyov, S.A. ; Ramos, A.C.S. ; Cotta, M.A. ; Swart, J.W.
Pub. info.: Plasma processing XIV : proceedings of the international symposium.  pp.263-276,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-17