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Conference Proceedings

1. Evaluation of Unsaturated Fluorocarbons for Dielectric Etch Applications

Chatterjee, R. ; Karecki, S. ; Pruette, L. ; Reif, R.

Pub. info.:	Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium. pp.251-262, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-30

Conference Proceedings

2. Evaluation of C4F8O as an Alternative Plasma Enhanced Chemical Vapor Deposition Chamber Clean Chemistry

Pruette, L. ; Karecki, S. ; Reif, R. ; Tousignant, L. ; Reagen, W. ; Kesari, S. ; Zazzera, L.

Pub. info.:	Environmental issues in the electronics and semiconductor industries : proceedings of the second international symposium. pp.20-29, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-8

Conference Proceedings

3. DC Magnetron Reactive Sputtering of Low Stress AIN Piezoelectric Thin Films for MEMS Application

Cunningham, B. ; Hsieh, P. ; Reif, R.

Pub. info.:	Materials science of microelectromechanical systems (MEMS) devices : symposium held December 1-2, 1998, Boston, Massachusetts, U.S.A.. pp.165-170, 1999. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	546

Conference Proceedings

4. The Evaluation of Hexafluoro-1,3-Butadiene as an Environmentally Benign Dielectric Etch Chemistry in a Medium Density Etch Chamber

Chatterjee, R. ; Reif, R. ; Sparks, I. ; Vartanian, V. ; Goolsby, B. ; Mendicino, L.

Pub. info.:	Environmental issues with materials and processes for the electronics and semiconductor industries V : proceedings of the international symposium. pp.99-113, 2002. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-15

Conference Proceedings

5. PREPARATION AND PROPERTIES OF HYDROGENATED AMORPHOUS SILICON PRODUCED BY PLASMA-ENHANCED CHEMICAL VAPOR DECOMPOSITION OF SILANE

Tokuda, K. L. ; Adler, D. ; Reif, R.

Pub. info.:	Amorphous silicon semiconductors -- Pure and hydrogenated : symposium held April 21-24, 1987, Anaheim, California, U.S.A.. pp.255-260, 1987. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	95

Conference Proceedings

6. MODIFYTNG POLYCRYSTALLINE FILMS THROUGH ION CHANNELING

Iverson, R. B. ; Reif, R.

Pub. info.:	Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.. pp.543-548, 1984. New York. North-Holland
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	27

Conference Proceedings

7. MODIFYING CRYSTALLOGRAPHIC ORIENTATIONS OF POLYCRYSTALLINE Si FILMS USING ION CHANNELING

Kung, K. T-Y. ; Iverson, R. B. ; Reif, R.

Pub. info.:	Energy beam-solid interactions and transient thermal processing/1984 : symposium held November 26-30, 1984, Boston, Massachusetts, U.S.A.. pp.727-732, 1985. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	35

Conference Proceedings

8. CROSS-SECTIONAL TEM INVESTIGATION OF LOW-TEMPERATURE EPITAXIAL SILICON FILMS GROWN BY ULTRA-LOW PRESSURE CVD

Yew, T.R. ; Comfort, J.H. ; Garverick, L.M. ; Burger, W.R. ; Reif, R.

Pub. info.:	Photon, beam, and plasma stimulated chemical processes at surfaces : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.. pp.705-712, 1987. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	75

Conference Proceedings

9. GROWTH AND CHARACTERIZATION OF EPITAXIAL GaAs DEPOSITED BY PLASMA-ENCHANCED METAL-ORGANIC CHEMICAL VAPOR DEPOSITION

Huelsman, A. D. ; Yoon, E. ; Reif, R.

Pub. info.:	Plasma processing and synthesis of materials : symposium held April 21-23, 1987, Anaheim, California, U.S.A.. pp.235-242, 1987. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	98

10.

Conference Proceedings

10. High Density Plasma (HDP) Oxide Etching with Reduced Global Warming Emission Using 2H-Heptafluoropropane

Pruette, L. ; Karecki, S. ; Reif, R. ; Sparks, T. ; Beu, L. ; Vartanian, V.

Pub. info.:	Environmental issues in the electronics/semiconductor industries and electrochemical/photochemical methods for pollution abatement. pp.58-62, 1998. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	98-5

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Author: Reif, R.