1.

Conference Proceedings
Conference Proceedings
1. Process capability analysis of DUV alternating PSM and DUV attenuated PSM lithography for 100-nm gate fabrication
Kim,K. ; Mason,M.E. ; Randall,J.N. ; Kim,W.D.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.132-148,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Mask error factor impact on the 130-nm node
Randall,J.N. ; Baum,C.C. ; Kim,K. ; Mason,M.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.588-593,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Manufacturability of 248-nm phase-shift lithography for 100-nm transistors
Mason,M.E. ; Randall,J.N. ; Kim,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1347-1359,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process
Palmer,S.R. ; Mason,M.E. ; Randall,J.N. ; Aton,T. ; Kim,K. ; Tritchkov,A.V. ; Burdorf,J. ; Rieger,M.L. ; Stirniman,J.P.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.921-932,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Some challenges for mask making to keep up with the roadmap
Jonckheere,R. ; Randall,J.N. ; Marschner,T. ; Ronse,K.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.313-324,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
6.

Conference Proceedings
Conference Proceedings
6. Advances in stencil mask technology:control of distortion in ion-projection lithography masks
Wolfe,J.C. ; Shimkunas,A.R. ; Melngailis,J. ; Loschner,H. ; Mohondro,R.D. ; Randall,J.N.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.238-246,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621