1.

Conference Proceedings
Conference Proceedings
1. Eco-innovation diffusion in artifact systems
Rai, R. ; Allada, V.
Pub. info.: Environmentally conscious manufacturing II : 28-29 October 2001, Newton, [Massachusetts] USA.  pp.32-43,  2002.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4569
2.

Conference Proceedings
Conference Proceedings
2. Growth and Characterization of K2Cr2O7 Doped PbI2 Single Crystal
Kumar, Sanjeev ; Momeen ; Khan, M.Y. ; Rai, R.
Pub. info.: Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001).  VOL-2  pp.1310-1311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4746
3.

Conference Proceedings
Conference Proceedings
3. Differential Suicide Thickness for ULSI Scaling*
Taylor, W.J., Jr. ; Smith, I. ; Nguyen, J.-Y. ; Rai, R. ; Adetutu, O. ; Geren, J. ; Ybarra, J. ; Petru, D.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.278-287,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
4.

Conference Proceedings
Conference Proceedings
4. 44. Poly-Si gate CMOS with hafnium silicate gate dielectric
Hobbs, C. ; Grant, J. ; Kher, S. ; Dhandapani, V. ; Taylor, B. ; Dip, L. ; Hegde, R. ; Metzner, C. ; Tseng, H. ; Gilmer, D. ; Franke, A. ; Garcia, R. ; Ilebert, L. ; Azrak, M. ; Sing, D. ; Stephens, J.K ; Scrogum, C. ; Rai, R. ; Becnel, V ; Conner, I ; White, B. ; Tobin, P.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.361-366,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
5.

Conference Proceedings
Conference Proceedings
5. 43. Roadblocks and detours for poly-silicon / metal-oxide MOS integration
Gilmer, D.C. ; Hobbs, C. ; Grant, J. ; Hegde, R. ; Tseng, H. ; Triyoso, D. ; Roan, D. ; Cotton, R. ; Smith, J ; Dhandapani, V ; Garcia, R. ; Dip, L. ; Rai, R. ; Conner, J ; Samavedam, S. ; Taylor, B. ; Tobin, P.J.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.345-360,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
6.

Conference Proceedings
Conference Proceedings
6. 31 New Materials, Processes and Device Structures for 65nm CMOS Technology Node and Beyond
Nguyen, B.-Y. ; Them, A. ; Zhang, D. ; White, T. ; Sadaka, M. ; Triyoso, D. ; Schaeffer, J. ; Goolsby, B. ; Dhandapani, V. ; Nguyen, T. ; Vartanian, V. ; McCormick, L. ; Theodore, D. ; Zollner, S. ; Xie, Q. ; Wang, X.-D. ; Canonico, M. ; Kotte, M. ; Shi, Z. ; Mathew, L. ; Zavala, M. ; Parker, C. ; Cottard, H. ; Hildreth, J. ; Prabhu, L. ; Rai, R. ; Murphy, S. ; Montgomery, P. ; Kalpat, S. ; Ramon, M. ; Demkov, A. ; Taylor, B. ; Gilmer, D. ; Adams, V. ; Jiang, J. ; Chen, J. ; Chang, C.-H. ; Kaushik, V. ; Chandna, L. ; Sadd, M. ; Barr, A. ; Vandooren, A. ; Pham, D. ; Mendlcino, M. ; Cheek, J. ; Tseng, H. ; White, B. ; Tobin, P. ; Orlowski, M. ; Venkatesan, S. ; Mogab, J. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.259-273,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
7.

Conference Proceedings
Conference Proceedings
7. Multiple Independent gate field effect transistors-device, process, applications Invited
Mathew, L. ; Sadd, M. ; Thean, A. ; Stephens, T. ; Mora, R. ; Zavala, M. ; Nguyen, B.Y. ; Rai, R. ; Backer, S. ; Shimer, R. ; Zang, W. ; Chowdhry, M.M. ; Fossum, J.G.
Pub. info.: Silicon-on-insulator technology and devices XII : proceedings of the international symposium.  pp.273-282,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-03