1.

Conference Proceedings
Conference Proceedings
1. Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography
Padmanaban, M. ; Renfkiewicz, D. ; Lee, S. ; Hong, C. ; Lee, D. ; Rahman, D. ; Sakamuri, R. ; Dammel, R. R.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.252-260,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Study of the effect of amine additives on LWR and LER [6153-44]
Houlihan, F. M. ; Rentkiewicz, D. ; Lin, G. ; Rahman, D. ; Mackenzie, D. ; Timko, A. ; Kudo, T. ; Anyadiegwu, C. ; Thiyagarajan, M. ; Chiu, S. ; Romano, A. ; Dammel, R. R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615317-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
3.

Conference Proceedings
Conference Proceedings
3. Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
Kudo, T. ; Lin, G. ; Lee, D. ; Rahman, D. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Chiu, S. ; Houlihan, F. ; Rentkiewicz, D. ; Dammel, R. R. ; Padmanaban, M. ; Biafore, J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
4.

Conference Proceedings
Conference Proceedings
4. E-beam curing effects on the etch and CD-SEM stability of 193-nm resists
Padmanaban, M. ; Alemy, E. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; McKenzie, D.S. ; Orsi, A. ; Rahman, D. ; Chen, W.-L. ; Sadjadi, R.M. ; Livesay, W.R. ; Ross, M.F.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.606-614,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. A study on the dissolution inhibition of poly norbornene hexafluoroisopropanol in aqueous base solutions
Toukhy, M.A. ; Oberlander, J. ; Rahman, D. ; Houlihan, F.M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.384-391,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Performance of imide and methide onium PAGs in 193-nm resist formulations
Padmanaban, M. ; Dammel, R.R. ; Lee, S.H. ; Kim, W.-K. ; Kudo, T. ; McKenzie, D.S. ; Rahman, D.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.743-751,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039