1.

Conference Proceedings
Conference Proceedings
1. Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation
M. Plat ; W.R. Brunsvold ; R.S. Smith ; N.K. Eib ; C.F. Lyons
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.272-281,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438
2.

Conference Proceedings
Conference Proceedings
2. Investigation into the origin of microbridging in chemically amplified negative-tone photoresists
L.L. Linehan ; R.S. Smith ; J. Dorn ; J.T. Fahey ; W.M. Moreau
Pub. info.: Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California.  pp.211-222,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2438