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Conference Proceedings

1. Effect of molecular weight distribution on the dissolution properties of novolac blends

P.C. Tsiartas ; L.L. Simpson ; A. Qin ; C.G. Willson ; R.D. Allen

Pub. info.:	Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California. pp.261-271, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2438

Conference Proceedings

2. Performance properties of near-monodisperse novolak resins

R.D. Allen ; K.J.R. Chen ; P.M. Gallagher-Wetmore

Pub. info.:	Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California. pp.250-260, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2438

Conference Proceedings

3. Supercritical fluid processing: a new dry technique for photoresist developing

P.M. Gallagher-Wetmore ; G.M. Wallraff ; R.D. Allen

Pub. info.:	Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California. pp.694-708, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2438

Conference Proceedings

4. 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system

R.D. Allen ; G.M. Wallraff ; R.A. DiPietro ; D.C. Hofer ; R.R. Kunz

Pub. info.:	Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California. pp.474-485, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2438