1.

Conference Proceedings
Conference Proceedings
1. Fluoro-alcohol materials with tailored interfacial properties for immersion lithography
D. P. Sanders ; L. K. Sundberg ; R. Sooriyakumaran ; P. J. Brock ; R. A. DiPietro ; H. D. Truong ; D. C. Miller ; M. C. Lawson ; R. D. Allen
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography
F. A. Houle ; A. Fornof ; R. Sooriyakumaran ; H. Truong ; D. C. Miller ; M. I. Sanchez ; B. Davis ; T. Magbitang ; R. D. Allen ; M. W. Hart ; G. Dubois
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
3.

Conference Proceedings
Conference Proceedings
3. Contact angles and structure/surface property relationships of immersion materials
L. K. Sundberg ; D. P. Sanders ; R. Sooriyakumaran ; P. J. Brock ; R. D. Allen
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
4.

Conference Proceedings
Conference Proceedings
4. The limitations of high-index resists for 193-nm hyper-NA lithography
G. Mcintyre ; D. Sanders ; R. Sooriyakumaran ; H. Truong ; R. Allen
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.692304-1-692304-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
5.

Conference Proceedings
Conference Proceedings
5. A new class of low bake resists for 193-nm immersion lithography
R. Sooriyakumaran ; R. DiPietro ; H. Truong ; P. Brock ; R. Allen
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69230C-1-69230C-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923