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Conference Proceedings

1. Meeting overlay requirements for future technology nodes with in-die overlay metrology

B. Schulz ; R. Seltmann ; J. Busch ; F. Hempel ; E. Cotte ; B. Alles

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

2. Best focus determination: bridging the gap between optical and physical topography

F. Kahlenberg ; R. Seltmann ; B. M. L. Fontaine ; R. Wirtz ; A. Kisteman ; R. N. M. Vanneer ; M. Pieters

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

3. An empirical approach adressing the transfer of mask placement errors during exposure

B. Alles ; B. Simeon ; E. Cotte ; T. Wandel ; B. Schulz ; R. Seltmann

Pub. info.:	EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6533

Conference Proceedings

4. Proposal for determining exposure latitude requirements

H. J. Levinson ; Y. Ma ; M. Koenig ; B. La Fontaine ; R. Seltmann

Pub. info.:	Optical Microlithography XXI. 1 pp.69241J-1-69241J-10, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924