1.

Conference Proceedings
Conference Proceedings
1. Photoluminescence Study of the Driving Force for Stacking Fault Expansion in 4H-SiC
R. Hirano ; Y. Sato ; M. Tajima ; K.M. Itoh ; K. Maeda
Pub. info.: Silicon carbide and related materials 2011 : selected, peer reviewed papers from the 14th International Conference on Silicon Carbide and Related Materials 2011 (ICSCRM 2011), September 11-16, 2011, Cleveland, Ohio, USA.  pp.395-398,  2012.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 717-720
2.

Conference Proceedings
Conference Proceedings
2. Separation of the Driving Force and Radiation-Enhanced Dislocation Glide in 4H-SiC
K. Maeda ; R. Hirano ; Y. Sato ; M. Tajima
Pub. info.: Defects-recognition, imaging and physics in semiconductors XIV : selected, peer reviewed papers from the 14th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors, September 25-29, 2011, Miyazaki, Japan.  pp.35-40,  2012.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 725
3.

Conference Proceedings
Conference Proceedings
3. Room-Temperature Photoluminescence Observation of Stacking Faults in 3C-SiC
R. Hirano ; M. Tajima ; K.M. Itoh
Pub. info.: Silicon carbide and related materials 2009 : selected peer reviewed papers from the International Conference on Silicon Carbide and Related Materials 2009, Nurnberg, Germany, October 11-16, 2009.  pp.355-358,  2010.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 645-648
4.

Conference Proceedings
Conference Proceedings
4. Polarized Photoluminescence from Partial Dislocations in 4H-SiC
R. Hirano ; M. Tajima ; H. Tsuchida ; K.M. Itoh ; K. Maeda
Pub. info.: Silicon carbide and related materials 2013 : selected, peer reviewed papers from the 15th International Conference on Silicon Carbide and Related Materials (ICSCRM 2013), September 29 - October 4, 2013, Miyazaki, Japan.  pp.319-323,  2014.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 778-780
5.

Conference Proceedings
Conference Proceedings
5. Reticle flexure influence on pattern positioning accuracy for reticle writing
R. Hirano ; K. Matsuki ; S. Yoshitake ; Y. Takahashi ; S. Tamamushi
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.235-241,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
6.

Conference Proceedings
Conference Proceedings
6. Analysis of pattern shift error for mask clamping measured by Nikon XY-31
S. Yoshitake ; K. Matsuki ; S. Yamasaki ; R. Hirano ; S. Tamamushi
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.242-252,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
7.

Conference Proceedings
Conference Proceedings
7. Development of advanced mask inspection optics with transmitted and reflected light image acquisition
R. Hirano ; R. Ogawa ; H. Suzuki ; K. Takahara ; Y. Tsuji ; S. Murakami ; N. Kikuiri ; K. Usuda
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
8.

Conference Proceedings
Conference Proceedings
8. Development of a captured image simulator for 199 nm mask inspection tools
M. Shiratsuchi ; Y. Honguh ; R. Hirano ; R. Ogawa
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
9.

Conference Proceedings
Conference Proceedings
9. Development of a captured image simulator for the differential interference contrast microscopes aiming to design 199 nm mask inspection tools
M. Shiratsuchi ; Y. Honguh ; R. Hirano ; R. Ogawa ; M. Hirono
Pub. info.: Photomask technology 2007.  3  pp.67304W-1-67304W-11,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730