1.

Conference Proceedings
Conference Proceedings
1. Scatterometry based profile metrology of two-dimensional patterns of EUV masks
I. Pundaleva ; R. Chalykh ; H. Kim ; B. Kim ; H. Cho
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
2.

Conference Proceedings
Conference Proceedings
2. Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes
I. Pundaleva ; R. Chalykh ; J. Lee ; S. Choi ; W. Han
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Image analysis of alignment and overlay marks with compound structure
R. Chalykh ; I. Pundaleva ; J. Shin ; S. Kim ; H. Cho ; J. Moon
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
4.

Conference Proceedings
Conference Proceedings
4. Overlay metrology for dark hard mask process: simulation and experiment study
J. Shin ; R. Chalykh ; H. Kang ; S. Kim ; S. Lee ; H. Cho
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
5.

Conference Proceedings
Conference Proceedings
5. Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity
I. Pundaleva ; R. Chalykh ; M. Lee ; H. Kim ; B. Kim
Pub. info.: Optical Microlithography XXI.  3  pp.69244H-1-69244H-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924