1.

Conference Proceedings
Conference Proceedings
1. Pupil plane analysis on AIMS 45-193i for advanced photomasks
Y. Morikawa ; T. Sutou ; K. Mesuda ; T. Nagai ; Y. Inazuki ; T. Adachi ; N. Toyama ; H. Mohri ; N. Hayashi ; U. Stroessner ; R. Birkner ; R. Richter ; T. Scheruebl
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Wafer level CD metrology on photomasks using aerial imaging technology
T. Scherübl ; U. Strößner ; H. Seitz ; R. Birkner ; R. Richter
Pub. info.: Photomask and next-generation lithography mask technology XV.  2  pp.70282W-1-70282W-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
3.

Conference Proceedings
Conference Proceedings
3. Phame: phase measurements on 45nm node phase shift features
U. Buttgereit ; R. Birkner ; D. Seidel ; S. Perlitz ; V. Philipsen
Pub. info.: Photomask and next-generation lithography mask technology XV.  2  pp.70282Z-1-70282Z-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
4.

Conference Proceedings
Conference Proceedings
4. AIMS and resist simulation
U. Strößner ; H. Seitz ; R. Birkner ; R. Richter ; T. Scherübl
Pub. info.: Photomask technology 2008.  1  pp.71221D-1-71221D-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
5.

Conference Proceedings
Conference Proceedings
5. AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35
E. Hendrickx ; R. Birkner ; M. Kempsell ; A. Tritchkov ; G. Vandenberghe
Pub. info.: Photomask technology 2008.  1  pp.71221E-1-71221E-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
6.

Conference Proceedings
Conference Proceedings
6. Using the AIMS 45-193i for hyper-NA imaging applications
P. De Bisschop ; V. Philipsen ; R. Birkner ; U. Buttgereit ; R. Richter
Pub. info.: Photomask technology 2007.  1  pp.67301G-1-67301G-12,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
7.

Conference Proceedings
Conference Proceedings
7. Phase metrology on 45-nm node phase-shift mask structures
K. M. Lee ; M. Tavassoli ; U. Buttgereit ; D. Seidel ; R. Birkner
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222A-1-69222A-6,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
8.

Conference Proceedings
Conference Proceedings
8. Programmed defects study on masks for 45nm immersion lithography using the novel AIMS 45-193i
T. Scheruebl ; A. C. Duerr ; K. Boehm ; R. Birkner ; R. Richter ; U. Stroessner
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533