1.

Conference Proceedings
Conference Proceedings
1. EFFECT OF GaAs SURFACE STOICHIOMETRY ON THE INTERFACE OF AS-GROWN EPITAXIAL ZnSe/EPITAXIAL GaAs HETEROSTRUCTURES
Qui, J. ; Gunshor, R.L. ; Kobayashi, M. ; Menke, D.R. ; Qian, Q.-D. ; Li, D. ; Otsuka, N.
Pub. info.: Properties of II-VI semiconductors : bulk crystals, epitaxial films, quantum well structures, and dilute magnetic systems : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A..  pp.115-120,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 161
2.

Conference Proceedings
Conference Proceedings
2. DFM through correct process construction
Qian, Q.-D.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.93-100,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
3.

Conference Proceedings
Conference Proceedings
3. LithoScope: an advanced physical modeling system for mask layout data verification
Qian, Q.-D.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.144-152,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
4.

Conference Proceedings
Conference Proceedings
4. Controlling defocus impact on OPC performance
Takase, S. ; Qian, Q.-D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.847-854,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. LithoScope: simulation-based mask layout verification with physical resist model
Qian, Q.-D.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1234-1241,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
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Conference Proceedings
Conference Proceedings
6. Defect printability analysis study using virtual stepper system in a production environment
Chiou, S.Y. ; Lei, H. ; Liu, W.J. ; Chu, M.J. ; Chiang, D. ; Tuan, S. ; Hong, C.-L. ; Chang, M. ; Chen, J.-H. ; Chan, K.K. ; Qian, Q.-D. ; Cai, L. ; Pang, L.Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.23-34,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
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Conference Proceedings
Conference Proceedings
7. Digital image processor for complex shape metrology
Qian, Q.-D.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1085-1091,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Defect printability analysis on alternating phase-shifting masks
Pang, L. ; Qian, Q.-D. ; Chan, K.K. ; Morikawa, Y. ; Nishiguchi, M. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.614-621,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
9.

Conference Proceedings
Conference Proceedings
9. Defect dispositiong using mask printability analysis on alternating phase-shifting masks
Chang, C.-H. ; Hsieh, C.-H. ; Tzu, S.-D. ; Dai, C.-M. ; Lin, B. J. ; Pang, L. ; Qian, Q.-D. ; Chen, J.-H. ; Huang, J. H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.622-629,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
10.

Conference Proceedings
Conference Proceedings
10. Simulation-based defect printability analysis on attenuated phase-shifting masks
Pang, L. ; Qian, Q.-D. ; Chan, K.K. ; Toyama, N. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.652-659,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754