1.

Conference Proceedings
Conference Proceedings
1. Improved scatterometry method of critical dimension measurements and its application for control of development process [6152-16]
Pundaleva, I. ; Nam, D. ; Han, H. ; Lee, D. ; Han, W.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61520G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
2.

Conference Proceedings
Conference Proceedings
2. Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]
Chalykh, R. ; Pundaleva, I. ; Kim, S. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Photomask Technology 2006.  pp.63491K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349