1.

Conference Proceedings
Conference Proceedings
1. In-line lithography cluster monitoring and control using integrated scatterometry
Pollentier, I. ; Cheng, S.Y. ; Baudemprez, B. ; Laidler, D. ; van Dommelen, Y. ; Carpaij, R. ; Yu, J. ; Uchida, J. ; Viswanathan, A. ; Chin, D. ; Barry, K. ; Jakatdar, N.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.105-115,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
2.

Conference Proceedings
Conference Proceedings
2. Immersion effects on lithography system performance [6154-30]
Nagahara, S. ; Pollentier, I. ; Machida, T. ; O’Brien, S. ; Jacobs, E. ; Schaap, C. ; Leroy, P. ; Storms, G. ; Nafus, K. ; Laidler, D. ; Cheng, S.
Pub. info.: Optical Microlithography XIX.  pp.61540U-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Comprehensive approach to MuGFET metrology [6152-45]
Lorusso. G. F ; Leray, P. ; Vandeweyer, T. ; Ercken, M. ; Delvaux, C. ; Pollentier, I. ; Cheng, S. ; Collaert, N. ; Rooyackers, R. ; Degroote, B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615219-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
4.

Conference Proceedings
Conference Proceedings
4. Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists
Ercken, M. ; Leunissen, L.H.A. ; Pollentier, I. ; Patsis, G.P. ; Constantoudis, V. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.266-275,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
5.

Conference Proceedings
Conference Proceedings
5. Optimization of scatterometry parameters for shallow trench isolation (STI) monitor
Leray, P.J. ; Cheng, S. ; Kremer, S. ; Ercken, M. ; Pollentier, I.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.576-586,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Electrical linewidth metrology for sub-65-nm applications
Storms, G. ; Cheng, S. ; Pollentier, I.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.614-622,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
7.

Conference Proceedings
Conference Proceedings
7. Characterization of integrated optical CD for process control
Yu, J. ; Uchida, J. ; van Dommelen, Y. ; Carpaij, R. ; Cheng, S. ; Pollentier, I. ; Viswanathan, A. ; Lane, L. ; Barry, K.A. ; Jakatdar, N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1059-1068,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375