1.

Conference Proceedings
Conference Proceedings
1. Advantages of isofocal printing in maskmaking with the ALTA 3500
Fuller,S.E. ; Pochkowski,M.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.66-72,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
2.

Conference Proceedings
Conference Proceedings
2. Characterization of a non-chemically amplified resist for photomask fabrication using a 257-nm optical pattern generator
Rathsack,B.M. ; Tabery,C.E. ; Stachowiak,T.B. ; Dallas,T.E. ; Xu,C.-B. ; Pochkowski,M. ; Willson,C.G.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.80-92,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Characterization of optical proximity correction features
Allgair,J.A. ; Ivy,M. ; Lucas,K. ; Sturtevant,J.L. ; Elliott,R.C. ; Mack,C.A. ; MacNaughton,C.W. ; Miller,J.D. ; Pochkowski,M. ; Preil,M.E. ; Robinson,J.C. ; Santos,F.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.200-207,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
4.

Conference Proceedings
Conference Proceedings
4. Application of critical shape analyses to two-dimensional patterns
Pochkowski,M. ; Mack,C.A. ; Kasprowicz,B.S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.169-176,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
5.

Conference Proceedings
Conference Proceedings
5. Metrology and analysis of two-dimensional SEM patterns
Mack,C.A. ; Jug,S. ; Jones,R. ; Apte,P. ; Williams,S. ; Pochkowski,M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.377-384,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344